| 摘要 |
PROBLEM TO BE SOLVED: To provide a device capable of analyzing a deposit with high sensitivity by a laser plasma method.SOLUTION: A deposit detachment laser beam L2 is projected onto a sample S while making the beam pass through a capture member 55, and simultaneously the sample S is scanned under the capture member 55. A deposit is captured by the capture member 55 from a wide region of the sample S. Then, an adhesion surface of the capture member 55 is directed toward a laser irradiation side, and a plasma emission laser beam L1 is projected to cause a deposit F captured to emit light for performing light emission analysis. |
