发明名称 化合物半導体装置
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor device and a manufacturing method of the same which can suppress a phase difference in potential of a gate electrode.SOLUTION: The compound semiconductor device comprises a substrate, an electron transit layer formed over the substrate, an electron supply layer formed over the electron transit layer, and a plurality of gate electrodes 5g formed over the electron supply layer, and a gate pad 8g to which the plurality of gate electrodes 5g are connected. A gate width of the gate electrode 5g becomes narrower with distance from the gate pad 8g.
申请公布号 JP6025295(B2) 申请公布日期 2016.11.16
申请号 JP20100144080 申请日期 2010.06.24
申请人 富士通株式会社 发明人 鎌田 陽一
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
代理机构 代理人
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