发明名称 マスクパターンの製造方法
摘要 PROBLEM TO BE SOLVED: To widen an interval of wiring patterns generated by an automatic layout tool or the like.SOLUTION: A linear part divided from a first wiring pattern in a wiring pattern dividing step S4 and a linear part divided from a second wiring pattern opposing the first wiring pattern at a predetermined interval or closer are disposed in different layers so as not to oppose each other at the predetermined interval or closer in a different layer arrangement step S10. In a pattern combination step S14, the wiring patterns are combined and in a mask data output step S16, mask data are outputted.
申请公布号 JP6028516(B2) 申请公布日期 2016.11.16
申请号 JP20120231609 申请日期 2012.10.19
申请人 富士通セミコンダクター株式会社 发明人 福田 昌俊
分类号 H01L21/82;H01L21/3205;H01L21/768;H01L21/822;H01L23/522;H01L27/04 主分类号 H01L21/82
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