发明名称 荷電粒子ビーム描画装置及び多重描画用の荷電粒子ビームの照射時間振り分け方法
摘要 A beam writing apparatus includes a unit to obtain a specific value by calculating an integer by dividing a total irradiation time by a multiplied value of a region number and a repeating times number, and by multiplying the integer by the repeating times number, to add the repeating times number to the specific value when a region is in the multiple writing unit regions and is not a specific region and when a region number of the multiple writing unit region, defined excluding the specific region, is below or equal to a value obtained by dividing the total irradiation time by the multiplied value of the region number and the repeating times number, to obtain a first remainder, and dividing the first remainder by the repeating times number, and to treat an added value of the repeating times number and the specific value, as a total irradiation time.
申请公布号 JP6027798(B2) 申请公布日期 2016.11.16
申请号 JP20120154457 申请日期 2012.07.10
申请人 株式会社ニューフレアテクノロジー 发明人 八島 純;安保 彰人;加藤 靖雄
分类号 H01L21/027;G03F7/20;H01J37/305 主分类号 H01L21/027
代理机构 代理人
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