发明名称 LaNiO3薄膜形成用組成物及びこの組成物を用いたLaNiO3薄膜の形成方法
摘要 A LaNiO 3 thin film having extremely few voids is uniformly formed. Provided is a LaNiO 3 thin film-forming composition for forming a LaNiO 3 thin film. It induces: a LaNiO 3 precursor; a first organic solvent; a stabilizer; and a second organic solvent. The first organic solvent includes carboxylic acids, alcohols, esters, ketones, ethers, cycloalkanes, aromatic compounds, or tetrahydrofuran. The stabilizer includes ²-diketones, ²-ketones, ²-keto esters, oxyacids, diols, triols, carboxylic acids, alkanolamines, or polyvalent amines. The second organic solvent has a boiling point of 150°C to 300°C and a surface tension of 20 to 50 dyn/cm. The LaNiO 3 precursor content is I to 20 mass% with respect to 100 mass% of the composition. The stabilizer content is 0 to 10 mol with respect to 1 mol of a total amount of the LaNiO 3 precursors. The second organic solvent content is 5 to 20 mass% with respect to the composition.
申请公布号 JP6024502(B2) 申请公布日期 2016.11.16
申请号 JP20130025671 申请日期 2013.02.13
申请人 三菱マテリアル株式会社 发明人 藤井 順;桜井 英章;曽山 信幸
分类号 H01L41/187;H01G4/008;H01G4/12;H01G4/33;H01L21/316;H01L21/8246;H01L27/105;H01L41/39;H01L41/43 主分类号 H01L41/187
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