METHOD FOR PRODUCING INDIUM-CONTAINING OXIDE FILM, INDIUM-CONTAINING OXIDE FILM, THIN-FILM TRANSISTOR, AND ELECTRONIC DEVICE AND FILM FORMING APPARATUS

摘要

One embodiment of the present invention provides a method for producing an indium-containing oxide film and an application thereof, the method comprising a step for spraying a solution containing a solvent, indium ions, and nitric acid ions onto a heated substrate, and irradiating the substrate with ultraviolet light from an ultraviolet light source while supplying inert gas in a direction from the ultraviolet light source toward the substrate, to form the indium-containing oxide film on the substrate.