| 摘要 |
An imprint apparatus molds a resin on a substrate with a mold and cures it by irradiation with a light to form a pattern on the substrate. This imprint apparatus includes an light irradiation unit configured to irradiate the light, and a mold holding unit configured to hold the mold, and at which an opening is formed to allow passage of the light irradiated from the light irradiation unit toward the substrate via the mold. Here, at least a portion of the surface of the mold holding unit which a reflected light that is reflected by at least either the substrate or the mold is can be incident has a reflectance that is lower than the reflectance of the surface of the mold relative to the light that is irradiated from the light irradiation unit. |
