| 摘要 |
An imprint apparatus forms a pattern of an imprint material on a substrate with a mold. A holding unit holds the mold by attracting a first surface that is opposite to a second surface on which the pattern is formed, of the mold, with a suction unit. A suction force adjusting unit adjusts a suction force. A shape correcting unit applies a force to a lateral surface of the mold, such that a shape of a pattern region of the mold gets closer to a shape of a substrate-side pattern region of the substrate. The first mold surface includes first and second regions, the second region being closer to a center of the mold from the lateral surface than the first region. The suction force adjusting unit adjusts the suction force so that a suction force of the first region is lower than that of the second region. |
