| 发明名称 |
POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE |
| 摘要 |
The present invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The polishing composition has a volume average particle diameter D A of grains in the polishing composition of 20 nm to 60 nm measured by dynamic light scattering at a concentration equivalent to 0.2 % abrasive content by mass. |
| 申请公布号 |
EP2957613(A4) |
申请公布日期 |
2016.11.09 |
| 申请号 |
EP20140751996 |
申请日期 |
2014.02.10 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
TSUCHIYA, KOHSUKE;TANSHO, HISANORI;ASADA, MAKI;SUGA, YUSUKE |
| 分类号 |
C09K3/14;B24B37/00;B24B37/04;C09G1/02;H01L21/02 |
主分类号 |
C09K3/14 |
| 代理机构 |
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