发明名称 酸化物半導体膜の評価方法
摘要 PROBLEM TO BE SOLVED: To provide an oxide semiconductor material which imparts good reliability to a transistor.SOLUTION: A formula (&sgr;=4&pgr;*nk*E*&egr;/h) for determining optical conductivity &sgr; is derived with a formula representing the imaginary part &egr;of complex dielectric constant and a formula representing light energy E. Here, &egr;is the vacuum permittivity, h is Planck constant, and &pgr; is the ratio of the circumference of a circle to its diameter, and the optical conductivity &sgr; is calculated using extinction coefficient k and refractive index n of an oxide semiconductor film measured with an optical measuring instrument. A semiconductor device is manufactured using an oxide semiconductor film in which the optical conductivity &sgr;, when irradiated with the light of energy 4 eV, is 410 &OHgr;cmor less.
申请公布号 JP6022838(B2) 申请公布日期 2016.11.09
申请号 JP20120161048 申请日期 2012.07.20
申请人 株式会社半導体エネルギー研究所 发明人 本田 達也;太田 将志;鎌田 のぞみ
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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