发明名称 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム
摘要 A substrate treatment method includes: a polymer separation step of phase-separating a block copolymer into a hydrophilic polymer and a hydrophobic polymer; and a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein in the polymer removal step, the hydrophilic polymer is removed by: irradiating the phase-separated block copolymer with an energy ray; then supplying a first polar organic solvent having a first degree of dissolving the hydrophilic polymer, being lower in boiling point than water and capable of dissolving water, and not dissolving the hydrophobic polymer, to the block copolymer; and then supplying a second polar organic solvent having a second dissolving degree lower than the first dissolving degree, being higher in boiling point than water, and not dissolving the hydrophobic polymer, to the block copolymer.
申请公布号 JP6023010(B2) 申请公布日期 2016.11.09
申请号 JP20130133383 申请日期 2013.06.26
申请人 東京エレクトロン株式会社 发明人 村松 誠;北野 高広;冨田 忠利;西 孝典;川上 真一路;山内 剛
分类号 H01L21/027;G03F7/40 主分类号 H01L21/027
代理机构 代理人
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