| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure equipment capable of preventing or reducing generation of pressing force between a mask and a substrate to prevent or suppress breaking of the substrate.SOLUTION: Exposure equipment 100 comprises a mask holder 11 and a substrate stage 12. A plurality of gap regulation mechanisms arranged around a mask M or a substrate W and capable of adjusting lengths thereof are provided in one of the mask holder 11 and the substrate stage 12. The gap regulation mechanisms are brought into contact with the other of the mask holder 11 and the substrate stage 12 when a gap between the mask and the substrate reaches a desired gap. |
