发明名称 温度制御可能なステージを含むシステム、半導体製造装置及びステージの温度制御方法
摘要 There is provided a system including a temperature-controllable stage, which includes: a disc-shaped plate having a front surface on which a substrate is mounted and a rear surface; a heat exchanger configured to individually supply a heat exchange medium to a plurality of regions two-dimensionally arranged to face the rear surface of the plate and configured to individually recover the heat exchange medium supplied to the regions, the plurality of regions being obtained by dividing a plurality of zones defined to face the rear surface of the plate in the heat exchanger; and a plurality of valve units configured to control, for each of the plurality of zones, the supply or cutoff of the heat exchange medium to the plurality of regions by the heat exchanger.
申请公布号 JP6018606(B2) 申请公布日期 2016.11.02
申请号 JP20140132224 申请日期 2014.06.27
申请人 東京エレクトロン株式会社 发明人 廣木 勤
分类号 H01L21/683;G05D23/00;H01L21/3065 主分类号 H01L21/683
代理机构 代理人
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