微小電気機械システム（ＭＥＭＳ）デバイスを形成する方法

摘要

A method of forming a MEMS device (10) includes forming a sacrificial layer (34) over a substrate (12). The method further includes forming a metal layer (42) over the sacrificial layer (34) and forming a protection layer (44) overlying the metal layer (42). The method further includes etching the protection layer (44) and the metal layer (42) to form a structure (56) having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes etching the sacrificial layer (34) to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the etching of the sacrificial layer (34) to form the movable portion of the MEMS device (10).