| 摘要 |
PROBLEM TO BE SOLVED: To suppress deterioration of a seal member provided between a lid airtightly closing a carry-in/out port of a processing container and the processing container, and contamination of a processed substrate via the seal member when performing processing to the processed substrate using a high-pressure fluid in the processing container.SOLUTION: A first seal member 11 and a second seal member 12 are arranged in this order from a carry-in/out port 2 side to the outside of a processing container 1 between the processing container 1 and a lid 3 so as to surround the carry-in/out port 2 which carries in/out a wafer W in the processing container 1 and the first seal member 11 is made of a material having corrosion resistivity for a high-pressure fluid. Then, a nitrogen gas is supplied to a differential pressure mitigating region 13 in order to mitigate differential pressure applied to the first seal member 11, pressure in the differential pressure mitigating region 13 is set to be lower than pressure in the processing container 1 and higher than the outside of the processing container 1, and outflow of the nitrogen gas to the outside is prevented by the second seal member 12. |
