METHOD FOR HOTSPOT DETECTION AND RANKING OF A LITHOGRAPHIC MASK

摘要

The invention is related to a method for detecting and ranking hotspots in a lithographic mask used for printing a pattern on a substrate. According to preferred embodiments, the ranking is based on defect detection on a modulated focus wafer or a modulated dose wafer, wherein the actual de-focus or dose value at the defect locations is taken into account, in addition to the de-focus or dose setting applied to the lithographic tool when a mask pattern is printed on the wafer. Instead of the de-focus or dose, other lithographic parameters can be used as a basis for the ranking method.