发明名称 SUBSTRATE COMPRISING IMPROVED VIA PAD PLACEMENT IN BUMP AREA
摘要 Some novel features pertain to an integrated device that includes a substrate, a first via, and a first bump pad. The first via traverses the substrate. The first via has a first via dimension. The first bump pad is on a surface of the substrate. The first bump pad is coupled to the first via. The first bump pad has a first pad dimension that is equal or less then the first via dimension. In some implementations, the integrated device includes a second via and a second bump pad. The second via traverses the substrate. The second via has a second via dimension. The second bump pad is on the surface of the substrate. The second bump pad is coupled to the second via. The second bump pad has a second pad dimension that is equal or less then the second via dimension.
申请公布号 EP3084826(A1) 申请公布日期 2016.10.26
申请号 EP20140825040 申请日期 2014.12.17
申请人 QUALCOMM INCORPORATED 发明人 FU, JIE;ALDRETE, MANUEL;SHAH, MILIND PRAVIN
分类号 H01L23/498 主分类号 H01L23/498
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