发明名称 ROTATABLE HEATED ELECTROSTATIC CHUCK
摘要 An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.
申请公布号 EP3084819(A1) 申请公布日期 2016.10.26
申请号 EP20140872752 申请日期 2014.12.08
申请人 APPLIED MATERIALS, INC. 发明人 SUBRAMANI, ANANTHA K.;GOEL, ASHISH;WANG, WEI W.;SWAMINATHAN, BHARATH;PARKHE, VIJAY D.;YUAN, XIAOXIONG
分类号 H01L21/683;B23Q3/15;H02N13/00 主分类号 H01L21/683
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