发明名称 |
ROTATABLE HEATED ELECTROSTATIC CHUCK |
摘要 |
An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate. |
申请公布号 |
EP3084819(A1) |
申请公布日期 |
2016.10.26 |
申请号 |
EP20140872752 |
申请日期 |
2014.12.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SUBRAMANI, ANANTHA K.;GOEL, ASHISH;WANG, WEI W.;SWAMINATHAN, BHARATH;PARKHE, VIJAY D.;YUAN, XIAOXIONG |
分类号 |
H01L21/683;B23Q3/15;H02N13/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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