METHOD AND APPARATUS FOR PATTERNING OF GRAPHENE OXIDE

摘要

In accordance with an example embodiment of the present invention, a method is disclosed. The method comprises providing a substrate, depositing a graphene oxide (GO) film on the substrate, exposing at least one part of the GO film to photonic irradiation for reducing said at least one part of the GO film, thereby producing a pattern of at least one reduced GO (rGO) area in the GO film; and selectively depositing polar material onto the GO film according to said pattern of at least one rGO area.