| 发明名称 |
TAZAROTENE WITH LOW DIMER IMPURITY FOR TREATING ACNE OR PSORIASIS |
| 摘要 |
The present invention relates to a method of treating acne or psoriasis by topically administering Tazarotene substantially free of dimer impurity of formula 4,4-dimethyl-6-[4-(4,4-dimethylthiochroman-6-yl)-buta-1,3-diynyl]-thiochroman. |
| 申请公布号 |
US2016304503(A1) |
申请公布日期 |
2016.10.20 |
| 申请号 |
US201415103444 |
申请日期 |
2014.12.15 |
| 申请人 |
SUN PHARMACEUTICAL INDUSTRIES LIMITED |
发明人 |
THENNATI Rajamannar;REHANI Rajeev Budhdev;VAGHELA Mukesh Nathalal;PANDYA Rashminkumar Rameshchandra |
| 分类号 |
C07D409/06 |
主分类号 |
C07D409/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
1. A method of treating acne or psoriasis by topically administering tazarotene substantially free of dimer impurity of Formula II. |
| 地址 |
Mumbai IN |
