发明名称 HEAT TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment device which can prevent warpage occurring in a thin substrate to allow uniform heat treatment on the thin substrate.SOLUTION: In a heat treatment device, when a pressing member 10 descends, a rib region 101 of a substrate 100 is pressed by a pressing part 11 of the pressing member 10 and the rib region 101 is sandwiched between the pressing part 11 and a surface of a hot plate 20. At this time, a height regulation part 12 of the pressing member 10 abuts against the surface of the hot plate to regulate a height position of the pressing part 11. This makes it possible to press the rib region 101 as an edge of the substrate 100 to the hot plate 20 by the pressing part 11 at a constant pressing force.SELECTED DRAWING: Figure 6
申请公布号 JP2016184679(A) 申请公布日期 2016.10.20
申请号 JP20150064479 申请日期 2015.03.26
申请人 TECH IN TECH CO LTD 发明人 YOSHIDA MASAHIRO;AMINO TOSHIHIKO
分类号 H01L21/027;H01L21/683 主分类号 H01L21/027
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