发明名称 EPITAXIAL WAFER FOR HETEROJUNCTION BIPOLAR TRANSISTOR AND HETEROJUNCTION BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide an epitaxial wafer for a heterojunction bipolar transistor capable of reducing resistance of a sub-collector layer without reducing a current amplification factor and a heterojunction bipolar transistor.SOLUTION: An epitaxial wafer 100 for a heterojunction bipolar transistor includes a sub-collector layer 102, composed of n-type GaAs. The sub-collector layer 102 includes: an n-type impurity of a covalent bond radius smaller than a covalent bond radius of a substitution site; and an n-type impurity of a covalent bond radius larger than the covalent bond radius of the substitution site.SELECTED DRAWING: Figure 1
申请公布号 JP2016184675(A) 申请公布日期 2016.10.20
申请号 JP20150064409 申请日期 2015.03.26
申请人 SUMITOMO CHEMICAL CO LTD 发明人 MEGURO TAKESHI;FUJIO SHINJIRO
分类号 H01L21/331;H01L29/737 主分类号 H01L21/331
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