SUBSTRATE PROCESSING APPARATUS

摘要

The present invention comprises: a tube which has a space formed therein; a substrate support unit which has a plurality of substrates stacked in multiple layers inside the tube and has individually formed therein a plurality of processing spaces in which the plurality of substrates are processed, respectively; a first gas supply unit which is for supplying a first gas to all of the plurality of processing spaces; a second gas supply unit which has a plurality of injectors, disposed in correspondence with the plurality of processing spaces, respectively, such that a second gas is individually supplied to each of the plurality of substrates; and a discharge unit which is for discharging the gas inside the tube, thereby enabling individual supplying of the gases to every space in which each of the plurality of substrates is being processed.