发明名称 |
PLATING APPARATUS AND CONTAINER BATH |
摘要 |
Provided are a plating apparatus and a container bath, which have a simpler structure than a conventional system and are capable of improving uniformity of a plating thickness. The plating apparatus includes a plating tank which stores a plating liquid, a cathode member arranged inside the plating tank, a plating object arranged inside the plating tank to face the cathode member, an anode jig which contacts with the plating object, and a space formed between the cathode member and the plating object to be a flow passage to which the plating liquid flows from the plating tank. The plating liquid flows into the space from above relative to the space, and is sucked by a pump from below relative to the space. |
申请公布号 |
US2016305032(A1) |
申请公布日期 |
2016.10.20 |
申请号 |
US201515100446 |
申请日期 |
2015.04.16 |
申请人 |
YAMAMOTO-MS CO., LTD. ;KIYOKAWA PLATING INDUSTRY CO., LTD. |
发明人 |
YAMAMOTO Wataru;HARADA Fumio;KIYOKAWA Hajime |
分类号 |
C25D5/08;C25D17/02 |
主分类号 |
C25D5/08 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plating apparatus, comprising:
a plating tank storing a plating liquid; a cathode member arranged inside the plating tank; a plating object arranged inside the plating tank to face the cathode member; an anode member contacting with the plating object; and a space formed between the cathode member and the plating object to be a flow passage to which the plating liquid flows from the plating tank, wherein the plating liquid flows into the space from above relative to the space, and is sucked by a pump from below relative to the space. |
地址 |
Tokyo JP |