| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel composition capable of being used as an etching paste.SOLUTION: A composition contains: at least one etching composition selected from among a trifluoromethanesulfonic acid, a trifluoromethanesulfonate, and a trifluoromethanesulfonic acid ester; and a substance melting the etching composition at a temperature of 100-250°C. |
