DEVICE AND METHOD FOR COATING A SUBSTRATE

摘要

An apparatus for coating a substrate has a vacuum chamber designed to receive the substrate and at least one sputtering target to be ablated during operation of the apparatus by particle bombardment. At least one window is arranged in the wall of the vacuum chamber. A device for determining the wear of the sputtering target, by optically measuring the distance between at least one predefinable point outside the vacuum chamber and at least one predefinable point on the surface of the sputtering target, and including an evaluation device correcting for any parallax offset and/or a geometric distortion.