发明名称 INSTALLATION FOR THE VACUUM TREATMENT OF SUBSTRATES
摘要 Installation for vacuum treatment, particularly of substrates, includes several identical independent and aligned modules. Each module is provided with a vacuum treatment chamber and a transfer chamber having a mechanism for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber. A substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.
申请公布号 EP1525335(B1) 申请公布日期 2016.10.12
申请号 EP20030750835 申请日期 2003.07.23
申请人 H.E.F. 发明人 FOUREZON, GILLES;POIRSON, JEAN-MARC
分类号 C23C14/56;C23C16/54;H01L21/00;H01L21/677 主分类号 C23C14/56
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