| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having no generation of gaps in the phase under high temperature even in the case a retardation film is used as a base material.SOLUTION: Provided is a gas barrier film including: a base material as a retardation film in which retardation Re550 in the in-plane direction to light with a wavelength of 550 nm is 110 to 150 nm; and a gas barrier laye with a film thickness 1.0 to 2.5 times the Re550 on the retardation film. |
