| 摘要 |
The purpose of the present invention is to provide a method for forming an oxide thin film which has desired optical properties and can be formed at a high film formation speed while keeping the damage to the interface between a substrate and the oxide thin film at a low level. A method for forming an oxide thin film according to one embodiment of the present invention can form a film of an oxide on a substrate in a reaction chamber in which a target and the substrate are so arranged as to face each other. The method is characterized by comprising a step of supplying oxygen radical into the reaction chamber, a step of supplying an inert gas into the reaction chamber, and a step of supplying the oxygen radical and then sputtering the surface of the target with ions of the inert gas, whereby a film of an oxide composed of a material of the target which soars from the surface of the target and the oxygen radical is formed on the substrate. |
