发明名称 スリットノズル及び塗布装置及び塗布方法
摘要 PROBLEM TO BE SOLVED: To efficiently form a chemical-liquid coating film on a substrate having a circular arc edge or particularly a circular substrate at a thickness with less irregular coating.SOLUTION: A slit nozzle 10 including: a slit discharge port 10a; a manifold 10d temporarily storing a chemical liquid before being discharged; and a land portion 10e forming a chemical liquid path from the manifold 10d to the discharge port 10a comprises: a lower lip 54 of a plate shape having a circular arc side surface 54a extending in a circular arc manner and an upper surface 54c having a groove 54b formed in a region adjacent to the circular arc side surface 54a; and an upper lip 56 of a cover shape having a circular arc sidewall 56a extending in a circular arc manner to correspond to the circular arc side surface 54a of the lower lip 54 and a ceiling wall 56b opposed to the upper surface 54c of the lower lip 54. The discharge port 10a and the land portion 10e are formed between the circular arc side surface 54a of the lower lip 54 and the circular sidewall 56a of the upper lip 56, and the manifold 10d is formed between the groove 54b of the upper surface 54c of the lower lip 54 and the ceiling wall 56b of the upper lip 56.
申请公布号 JP6006685(B2) 申请公布日期 2016.10.12
申请号 JP20130143356 申请日期 2013.07.09
申请人 東京エレクトロン株式会社 发明人 太田 義治;稲益 寿史
分类号 B05C5/02;B05C11/10;B05D1/26 主分类号 B05C5/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利