| 摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive pad that improves flatness and planarization efficiency of a surface to be polished, causes less occurrence of a scratch, and is usable for a long period of time.SOLUTION: The abrasive pad includes a polishing layer containing a saponified ethylene-vinyl ester copolymer in which ethylene copolymerization rate is 35-55 mol% and a crystal fusion heat quantity is 60-110 J/g. The abrasive pad is used for polishing an insulating film or metal film having a Mohs hardness of 7 or less. |
