发明名称 加熱処理装置及び加熱処理方法
摘要 A heat treatment apparatus includes processing chambers into which microwaves with an effective wavelength of λg are introduced. The processing chambers are arranged parallel to each other. The length from an inner wall surface of one end of each processing chamber in the lengthwise direction to an inner wall surface of the other end thereof is m×λg/2 (m being a positive integer). An antenna sending microwave oscillation into the processing chambers is separated by λg/4+p×λg/2 (p being a positive integer including 0) from the inner wall surface of the end part in the lengthwise direction of each processing chamber. The processing chambers are disposed to be offset by λg/(2×n) (n being the number of the processing chambers) from each other in the lengthwise direction, when the processing chambers are seen to overlap with each other in a perpendicular direction to the lengthwise direction of each processing chamber.
申请公布号 JP6005549(B2) 申请公布日期 2016.10.12
申请号 JP20130037138 申请日期 2013.02.27
申请人 東京エレクトロン株式会社 发明人 河西 繁;三浦 仁嗣
分类号 H05B6/80;H01L21/20;H01L21/268;H05B6/64;H05B6/72 主分类号 H05B6/80
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