METHOD FOR COATING GLASS SUBSTRATES

摘要

2104592 9312892 PCTABS00024 A method for coating glass by chemical-vapor deposition below 200 ·C, at atmospheric pressure of a gaseous mixture of a tin oxide precursor, a silicon dioxide precursor and an accelerant such as triethyl phosphite provides deposition rates greater than 350 Å per second. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, and appearance.