Chemically amplified negative resist composition and pattern forming process
摘要
A polymer comprising recurring units having an acid-eliminatable group on a side chain and aromatic ring-bearing cyclic olefin units is used to formulate a chemically amplified negative resist composition. Any size shift between the irradiated pattern and the formed resist which can arise in forming a pattern including isolated feature and isolated space portions is reduced, and a high resolution is obtained.
申请公布号
EP2626743(B1)
申请公布日期
2016.10.12
申请号
EP20130154792
申请日期
2013.02.11
申请人
SHIN-ETSU CHEMICAL CO., LTD.;INTERNATIONAL BUSINESS MACHINES CORPORATION