| 摘要 |
PROBLEM TO BE SOLVED: To provide a mechanism for operating an element of a microlithographic projection exposure device, enabling active position control of the element with higher control quality.SOLUTION: A mechanism for operating an element of a microlithographic projection exposure device includes degree of freedom of a first number ncapable of transferring adjustable force to an optical element respectively, and actuators 111, 112, 113, and 114 of a second number nconnected to an optical element 100 respectively through a mechanical joint in order to transfer force to the optical element. The second number nis larger than the first number n. At least one of the actuators is arranged at a location serving as at least one of the nodes of an eigenmode of the optical element.SELECTED DRAWING: Figure 1 |
