| 摘要 |
PROBLEM TO BE SOLVED: To provide a ferromagnetic material sputtering target capable of improving leakage magnetic flux to allow stable discharge by a magnetron sputtering apparatus.SOLUTION: The ferromagnetic material sputtering target consists of a metal having a composition including Pt of 5-45 mol% and the remainder of Co. The structure of the target includes: a metal base (A); and a phase (B) consisting of large spherical Pt without including inorganic particles in the metallic base (A) and having the shortest diameter of 10-150 μm. The phase (B) consisting of the platinum includes 50 mol% or more, preferably, 95% or more of Pt included in the sputtering target. One or more inorganic material selected from carbon, oxide, nitride, carbide and carbon nitride is included in the metal base (A).SELECTED DRAWING: Figure 1 |
