| 发明名称 |
DOUBLE-DEPROTECTED CHEMICALLY AMPLIFIED PHOTORESISTS |
| 摘要 |
There are disclosed compositions requiring two acid-catalyzed steps for deprotection. The compositions are of formula I or formula II. Also disclosed are polymers formed from these compositions, and methods of using these compositions in, for example,photolithography. |
| 申请公布号 |
WO2016161067(A1) |
申请公布日期 |
2016.10.06 |
| 申请号 |
WO2016US25171 |
申请日期 |
2016.03.31 |
| 申请人 |
THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK;CENTRAL GLASS COMPANY, LTD. |
发明人 |
BRAINARD, Robert L.;EARLEY, William G.;CARDINEAU, Brian;AOKI, Takashi |
| 分类号 |
C07C69/025;C08F12/08;C08F20/18;G03F7/004;G03F7/039 |
主分类号 |
C07C69/025 |
| 代理机构 |
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