RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD

摘要

A radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically active compound (B), and a solvent (C). The solvent (C) content in the composition is 20%-99% by mass and the content of components other than the solvent (C) is 1%-80% by mass. The resist base material (A) is a compound indicated by a formula (1). (In the formula (1): R1 is a C1-30 2n-valent group; R2-R5 each independently indicate a C1-10 alkyl group, a C6-10 aryl group, a C2-10 alkyl group, a C1-30 alkoxy group, a halogen atom, a thiol group, or a hydroxyl group, however at least one R4 and/or at least one R5 is at least one type selected from a hydroxyl group and a thiol group; m2 and m3 each independently indicate an integer of 0-8; m4 and m5 each independently indicate an integer of 0-9, however m4 and m5 cannot both be 0 at the same time; n is an integer of 1-4; and p2-p5 each independently indicate an integer of 0-2.)