发明名称 EXPOSURE DOSE HOMOGENIZATION THROUGH ROTATION, TRANSLATION, AND VARIABLE PROCESSING CONDITIONS
摘要 A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.
申请公布号 WO2016160301(A1) 申请公布日期 2016.10.06
申请号 WO2016US21771 申请日期 2016.03.11
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC. 发明人 SCHATTENBURG, Mark L.;HENDEL, Rudolf H.;CARCASI, Michael
分类号 H01L21/027;G03F1/22 主分类号 H01L21/027
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