发明名称 METHOD OF DIVIDING WAFER
摘要 Disclosed herein is a method of dividing a wafer including an exposed area incising step of lowering a cutting blade to a preset lowered position for fully severing the wafer to cause the cutting blade to incise an exposed area of a wafer unit, an image capturing step of capturing an image of the exposed area which the cutting blade has incised in the exposed area incising step, with image capturing means, a determining step of determining whether or not it is possible to fully sever the wafer on the basis of the captured image in the image capturing step, and an adjusting step of increasing a distance by which to lower the cutting blade if it is determined that it is impossible to fully sever the wafer in the determining step.
申请公布号 US2016293501(A1) 申请公布日期 2016.10.06
申请号 US201615080919 申请日期 2016.03.25
申请人 DISCO CORPORATION 发明人 Miyata Satoshi;Tanaka Makoto;Chanvilai Sombat
分类号 H01L21/66;H01L21/683;H01L21/78 主分类号 H01L21/66
代理机构 代理人
主权项 1. A method of dividing a wafer having projected dicing lines thereon by holding on a chuck table a wafer unit which includes the wafer adhered to an adhesive tape that is adhered to a ring frame in closing relation to an opening of the ring frame, with an exposed area in which the adhesive tape is exposed between an outer circumferential edge of the wafer and an inner circumferential edge of the ring frame, and fully severing the wafer by a cutting blade along the projected dicing lines, the method comprising: an exposed area incising step of lowering the cutting blade to a preset lowered position for fully severing the wafer to cause the cutting blade to incise the exposed area of the wafer unit; an image capturing step of capturing an image of an area incised by the cutting blade with image capturing means in the exposed area incising step; a determining step of determining whether or not it is possible to fully sever the wafer on the basis of the image captured in the image capturing step; and an adjusting step of increasing a distance by which to lower the cutting blade if it is determined that it is impossible to fully sever the wafer in the determining step.
地址 Tokyo JP