VACUUM PLASMA SPRAYED COATING INCLUDING OXIDE DISPERSIONS

摘要

A technique may include controlling a vacuum pump to evacuate a vacuum chamber to high vacuum; controlling a plasma spray device to deposit a coating on a substrate in the vacuum chamber using plasma spray physical vapor deposition; and controlling a source of a reactive gaseous species to introduce a controlled amount of the reactive gaseous species into the vacuum chamber during the plasma spray physical vapor deposition process. The reactive gaseous species may react with at least one constituent of the coating to form a dispersed phase in at least part of the coating.

主权项

1. A system comprising:
a vacuum pump; a vacuum chamber; a plasma spray device; a source of a reactive gaseous species; and a computing device operable to:
control the vacuum pump to evacuate the vacuum chamber to high vacuum;control the plasma spray device to deposit a coating on a substrate in the vacuum chamber using plasma spray physical vapor deposition; andcontrol the source of the reactive gaseous species to introduce a controlled amount of the reactive gaseous species into the vacuum chamber during the plasma spray physical vapor deposition process, where the reactive gaseous species reacts with at least one constituent of the coating to form a dispersed phase in at least part of the coating.