RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD

摘要

A radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically-active compound (B), and a solvent (C). The solid component content in the radiation-sensitive composition is 1%-80% by mass, the solvent content is 20%-99% by mass, and the resist base material (A) is a compound indicated by formula (1).