SUBSTRATE FOR MASK BLANK, MASK BLANK, REFLECTION TYPE MASK BLANK, TRANSFER MASK, REFLECTION TYPE MASK AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a substrate for mask blank capable of eliminating adverse effects of a substrate mark consisting of slope cross section on flatness and enhancing flatness during abrasive processing, a mask blank and a transfer mask and a manufacturing method therefor.SOLUTION: A substrate for mask blank 1 has a substrate mark 4 consisting a slope cross section formed, an angle of inclination of the substrate mark 4 to a main surface 112 is more than 45° and less than 90° and a distance from a boundary between the main surface 112 and the substrate mark 4 to a circumference of the substrate for mask blank is 1 Wof less than 1.5 mm.SELECTED DRAWING: Figure 1