SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent the flow of a gas from being deviated within a processing container.SOLUTION: A substrate processing apparatus is provided that comprises: a substrate holder for holding a plurality of substrates in a shelf shape; a processing container including an inner cylinder for accommodating the plurality of substrates and the substrate holder therein and an outer cylinder disposed outside the inner cylinder; gas supply means for supplying a processing gas to and in parallel with surfaces to be processed of the plurality of substrates accommodated within the processing container; exhaust means for exhausting the processing gas within the processing container via a gas outlet; an exhaust port that is provided in a sidewall of the inner cylinder at a side opposite to the gas supply means via the substrate holder; and a flow straightening plate that is provided in an outer circumferential wall of the inner cylinder or an inner circumferential wall of the outer cylinder between the exhaust port and the gas outlet in a circumferential direction of the processing container. The flow straightening plate is provided in a perpendicular direction of the processing container so as to extend upwards from a lower side of a position corresponding to a lower end of the substrate holder to at least a position corresponding to a lower end of the exhaust port.SELECTED DRAWING: Figure 4