摘要 |
PROBLEM TO BE SOLVED: To provide a projection device for microlithography for photographing a visual field of an object.SOLUTION: A projection device includes: an objective lens 110; at least one or more manipulators 121, 122, and 123 that manipulate one or more optical elements 111, 112, and 113 of the objective lens 110; a control unit 130 that adjusts or controls the one or more manipulators 121, 122, and 123; a determination device 150 that determines at least one or more image aberrations of the objective lens; and a memory 140 that stores one or more upper bounds related to a specification of the objective lens including an upper bound of the image aberrations and/or the amount of travel of the manipulators.SELECTED DRAWING: Figure 1 |