发明名称 PROJECTION EXPOSURE DEVICE WITH OPTIMIZED ADJUSTMENT FUNCTION
摘要 PROBLEM TO BE SOLVED: To provide a projection device for microlithography for photographing a visual field of an object.SOLUTION: A projection device includes: an objective lens 110; at least one or more manipulators 121, 122, and 123 that manipulate one or more optical elements 111, 112, and 113 of the objective lens 110; a control unit 130 that adjusts or controls the one or more manipulators 121, 122, and 123; a determination device 150 that determines at least one or more image aberrations of the objective lens; and a memory 140 that stores one or more upper bounds related to a specification of the objective lens including an upper bound of the image aberrations and/or the amount of travel of the manipulators.SELECTED DRAWING: Figure 1
申请公布号 JP2016177310(A) 申请公布日期 2016.10.06
申请号 JP20160100442 申请日期 2016.05.19
申请人 CARL ZEISS SMT GMBH 发明人 BORIS BITTNER;HOLGER WALTER;MATTHIAS ROESCH
分类号 G02B7/00;G02B13/14;G02B13/18;G02B17/08;G03F7/20 主分类号 G02B7/00
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