| 摘要 |
This composition for forming a pattern contains a solvent and a block copolymer that forms a phase separation structure by self-assembling, and is characterized in that: the block copolymer has a first block that is composed of a substituted or unsubstituted styrene unit, a second block that is composed of a (meth)acrylate ester unit, and a first group that is bonded to at least one end of the main chain; and the first group is a monovalent group that forms a compound having a ClogP of from -1 to 3 (inclusive) when a methyl group is bonded to the main chain-side bonding hand. It is preferable that the first group is formed by means of a chain terminator; and if this is the case, it is preferable that the ClogP of the chain terminator is from -1.5 to 4.0 (inclusive). The ClogP of a compound that is formed when a methyl group is bonded to the main chain-side bonding hand of the first group is preferably 2.5 or less. The number of carbon atoms in the first group is preferably from 1 to 20 (inclusive). The number of heteroatoms in the first group is preferably from 1 to 5 (inclusive). |
