发明名称 |
Thin film deposition apparatus |
摘要 |
A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. A thin film deposition apparatus for forming a thin film on a substrate, the apparatus comprising: a deposition source arranged to discharge a deposition material; a first nozzle disposed downstream of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed downstream of the first nozzle and including a plurality of second slits arranged in a second direction perpendicular to the first direction; wherein the thin film deposition apparatus is arranged to perform deposition while the thin film deposition apparatus moves relative to the substrate in the first direction. |
申请公布号 |
EP2264214(B1) |
申请公布日期 |
2016.10.05 |
申请号 |
EP20100250963 |
申请日期 |
2010.05.24 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
LEE, CHOONG-HO;LEE, JUNG-MIN |
分类号 |
C23C14/24;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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