发明名称 Thin film deposition apparatus
摘要 A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. A thin film deposition apparatus for forming a thin film on a substrate, the apparatus comprising: a deposition source arranged to discharge a deposition material; a first nozzle disposed downstream of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed downstream of the first nozzle and including a plurality of second slits arranged in a second direction perpendicular to the first direction; wherein the thin film deposition apparatus is arranged to perform deposition while the thin film deposition apparatus moves relative to the substrate in the first direction.
申请公布号 EP2264214(B1) 申请公布日期 2016.10.05
申请号 EP20100250963 申请日期 2010.05.24
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 LEE, CHOONG-HO;LEE, JUNG-MIN
分类号 C23C14/24;H05B33/10 主分类号 C23C14/24
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