| 摘要 |
PROBLEM TO BE SOLVED: To highly accurately attain the automatic setting of a measurement region of a length measurement cursor concerning dimension measurement of a circuit pattern using a scanning electron microscope (SEM).SOLUTION: A pattern measurement device has: a first function of estimating whether design data of an OPC pattern or simulation pattern is formed as lines or corners in a pattern to be actually generated; and a second function of automatically setting the measurement region of a length measurement cursor in a region to be formed as lines. |
