| 摘要 |
A lithography apparatus comprising: a projection system configured to project a desired image onto a substrate; an active module (120) that generates a time-varying heat load; a temperature conditioning system (100) configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer (110) comprising a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load; and wherein the phase change material is stationary relative to the projection systems during critical operations of the lithography apparatus. |
