发明名称 |
PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICEMANUFACTURING METHOD, AND ELECTRONIC DEVICE |
摘要 |
A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern. |
申请公布号 |
SG11201606466Y(A) |
申请公布日期 |
2016.09.29 |
申请号 |
SG11201606466Y |
申请日期 |
2015.02.04 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
UEBA RYOSUKE;IGUCHI NAOYA;YAMANAKA TSUKASA;TANGO NAOHIRO;SHIRAKAWA MICHIHIRO;KATO KEITA |
分类号 |
G03F7/40;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
G03F7/40 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|